Departamento
Electricidad y Electrónica
Artigos (15) Publicacións nas que participase algún/ha investigador/a
2005
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A 2D-TLM model for electromagnetic wave propagation in chiral media
Microwave and Optical Technology Letters, Vol. 46, Núm. 2, pp. 180-182
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A comparative study of the electrical properties of TiO2 films grown by high-pressure reactive sputtering and atomic layer deposition
Semiconductor Science and Technology, Vol. 20, Núm. 10, pp. 1044-1051
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Atomistic analysis of the evolution of boron activation during annealing in crystalline and preamorphized silicon
Journal of Applied Physics, Vol. 97, Núm. 10
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Comparative study on electrical properties of atomic layer deposited high-permittivity materials on silicon substrates
Thin Solid Films, Vol. 474, Núm. 1-2, pp. 222-229
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Determination of the characteristic parameters of single and multi-exponential magnetic relaxation processes
Journal of Electrical Engineering, Vol. 55, Núm. 10 SUPPL, pp. 109-111
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Fermi-level effects in semiconductor processing: A modeling scheme for atomistic kinetic Monte Carlo simulators
Journal of Applied Physics, Vol. 98, Núm. 5
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Ion-beam amorphization of semiconductors: A physical model based on the amorphous pocket population
Journal of Applied Physics, Vol. 98, Núm. 4
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Modeling arsenic deactivation through arsenic-vacancy clusters using an atomistic kinetic Monte Carlo approach
Applied Physics Letters, Vol. 86, Núm. 25, pp. 1-3
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Molecular dynamics study of the configurational and energetic properties of the silicon self-interstitial
Physical Review B - Condensed Matter and Materials Physics, Vol. 71, Núm. 8
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Nonlinearity correction for multibit ΔΣ DACs
IEEE Transactions on Circuits and Systems I: Regular Papers, Vol. 52, Núm. 6, pp. 1033-1041
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PML absorbing boundary conditions for the multiresolution time-domain techniques based on the discrete wavelet transform
Applied Computational Electromagnetics Society Journal, Vol. 20, Núm. 3, pp. 207-211
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Physical atomistic kinetic Monte Carlo modeling of Fermi-level effects of species diffusing in silicon
Physical Review B - Condensed Matter and Materials Physics, Vol. 72, Núm. 3
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Role of silicon interstitials in boron cluster dissolution
Applied Physics Letters, Vol. 86, Núm. 3, pp. 1-3
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TLM simulation of electromagnetic wave propagation in anisotropic moving media
International Journal of Numerical Modelling: Electronic Networks, Devices and Fields, Vol. 18, Núm. 3, pp. 227-236
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Two-dimensional extension of a novel FDTD technique for modeling dispersive lossy bi-isotropic media using the auxiliary differential equation method
IEEE Microwave and Wireless Components Letters, Vol. 15, Núm. 5, pp. 375-377