Effect of substrate temperature in SiOxNy films deposited by electron cyclotron resonance

  1. Del Prado, A.
  2. Martínez, F.L.
  3. Mártil, I.
  4. González-Díaz, G.
  5. Fernández, M.
Aldizkaria:
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

ISSN: 0734-2101

Argitalpen urtea: 1999

Alea: 17

Zenbakia: 4

Orrialdeak: 1263-1268

Mota: Artikulua

DOI: 10.1116/1.582039 GOOGLE SCHOLAR
Datuen iturria: Scopus