Compositional analysis of thin SiO xN y:H films by heavy-ion ERDA, standard RBS, EDX and AES: A comparison
- Bohne, W.
- Röhrich, J.
- Schöpke, A.
- Selle, B.
- Sieber, I.
- Fuhs, W.
- Del Prado, Á.
- San Andrés, E.
- Mártil, I.
- González-Díaz, G.
ISSN: 0168-583X
Year of publication: 2004
Volume: 217
Issue: 2
Pages: 237-245
Type: Article