A comparative study of the electrical properties of TiO2 films grown by high-pressure reactive sputtering and atomic layer deposition
- Duẽas, S.
- Castán, H.
- García, H.
- Andrés, E.S.
- Toledano-Luque, M.
- Mártil, I.
- González-Díaz, G.
- Kukli, K.
- Uustare, T.
- Aarik, J.
ISSN: 0268-1242
Year of publication: 2005
Volume: 20
Issue: 10
Pages: 1044-1051
Type: Article