Carbon in silicon: Modeling of diffusion and clustering mechanisms

  1. Pinacho, R.
  2. Castrillo, P.
  3. Jaraiz, M.
  4. Martin-Bragado, I.
  5. Barbolla, J.
  6. Gossmann, H.-J.
  7. Gilmer, G.-H.
  8. Benton, J.-L.
Journal:
Journal of Applied Physics

ISSN: 0021-8979

Year of publication: 2002

Volume: 92

Issue: 3

Pages: 1582-1587

Type: Article

DOI: 10.1063/1.1489715 GOOGLE SCHOLAR