Integrated atomistic process and device simulation of decananometre MOSFETs

  1. Asenov, A.
  2. Jaraiz, M.
  3. Roy, S.
  4. Roy, G.
  5. Adamu-Lema, F.
  6. Brown, A.R.
  7. Moroz, V.
  8. Gafiteanu, R.
Actas:
International Conference on Simulation of Semiconductor Processes and Devices, SISPAD

ISBN: 4891140275

Ano de publicación: 2002

Volume: 2002-January

Páxinas: 87-90

Tipo: Achega congreso

DOI: 10.1109/SISPAD.2002.1034523 GOOGLE SCHOLAR