Atomistic analysis of the evolution of boron activation during annealing in crystalline and preamorphized silicon

  1. Aboy, M.
  2. Pelaz, L.
  3. Marqús, L.A.
  4. López, P.
  5. Barbolla, J.
  6. Duffy, R.
Journal:
Journal of Applied Physics

ISSN: 0021-8979

Year of publication: 2005

Volume: 97

Issue: 10

Type: Article

DOI: 10.1063/1.1904159 GOOGLE SCHOLAR
Data source: Scopus