Atomistic simulation of damage accumulation during shallow B and As implant into Si

  1. López, P.
  2. Pelaz, L.
  3. Marqués, L.A.
  4. Santos, I.
  5. Van Den Berg, J.A.
Proceedings:
2007 Spanish Conference on Electron Devices, Proceedings

ISBN: 9781424408689

Year of publication: 2007

Pages: 21-24

Type: Conference paper

DOI: 10.1109/SCED.2007.383987 GOOGLE SCHOLAR
Data source: Scopus