Atomistic modeling and physical comprehension of the effects of implant dose rate on boron activation in pMOSFET S/D

1. Singer, J.
2. Salvetti, F.
3. Kaeppelin, V.
4. Wacquant, F.
5. Cagnat, N.
6. Jaraiz, M.
7. Castrillo, P.
8. Rubio, E.
9. Poncet, A.