2 MeV electron irradiation effects on the electrical characteristics of metal-oxide-silicon capacitors with atomic layer deposited Al2O 3, HfO2 and nanolaminated dielectrics

1. Rafí, J.M.
2. Campabadal, F.
3. Ohyama, H.
4. Takakura, K.
5. Tsunoda, I.
6. Zabala, M.
7. Beldarrain, O.
8. González, M.B.
9. García, H.
10. Castán, H.
11. Gómez, A.
12. Dueñas, S.