Fundamental diffusion issues for deep-submicron device processing

  1. Cowern, N.E.B.
  2. Jaraiz, M.
  3. Cristiano, F.
  4. Claverie, A.
  5. Mannino, G.
Proceedings:
Technical Digest - International Electron Devices Meeting

ISSN: 0163-1918

Year of publication: 1999

Pages: 333-336

Type: Conference paper