Atomistic simulations of ion implantation and diffusion
- Gilmer, G.H.
- Pelaz, L.
- Jaraiz, M.
- Gossmann, H.-J.
- Rafferty, C.S.
Proceedings:
International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
Year of publication: 1999
Pages: 43-46
Type: Conference paper