Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry

1. Landesman, J.-P.
2. Cassidy, D.T.
3. Fouchier, M.
4. Pargon, E.
5. Levallois, C.
6. Mokhtari, M.
7. Jimenez, J.
8. Torres, A.