Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition

  1. Kukli, K.
  2. Aarik, L.
  3. Vinuesa, G.
  4. Dueñas, S.
  5. Castán, H.
  6. García, H.
  7. Kasikov, A.
  8. Ritslaid, P.
  9. Piirsoo, H.-M.
  10. Aarik, J.
Journal:
Materials

ISSN: 1996-1944

Year of publication: 2022

Volume: 15

Issue: 3

Type: Article

DOI: 10.3390/MA15030877 GOOGLE SCHOLAR lock_openOpen access editor

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