Boron-enhanced-diffusion of boron from ultra-low-energy boron implantation

  1. Agarwal, A
  2. Eaglesham, DJ
  3. Gossmann, HJ
  4. Pelaz, L
  5. Herner, SB
  6. Jacobson, DC
  7. Haynes, TE
  8. Erokhin, YE
Buch:
SILICON MATERIALS SCIENCE AND TECHNOLOGY, VOLS 1 AND 2
  1. Huff, HR (coord.)
  2. Tsuya, H (coord.)
  3. Gosele, U (coord.)

ISBN: 1-56677-193-5

Datum der Publikation: 1998

Seiten: 1232-1240

Kongress: 8th International Symposium on Silicon Materials Science and Technology

Art: Konferenz-Beitrag

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Fuente de los datos: WoS