InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides

1. Liu, B.
2. Landesman, J-P.
3. Leclercq, J-L.
4. Rhallabi, A.
5. Avella, M.
6. Gonzalez, M. A.
7. Jimenez, J.
8. Guilet, S.
9. Cardinaud, C.
10. Pommereau, F.