Publicaciones en las que colabora con Peter A. Stolk (5)

1999

  1. Cluster ripening and transient enhanced diffusion in silicon

    Materials Science in Semiconductor Processing, Vol. 2, Núm. 4, pp. 369-376

  2. Energetics of self-interstitial clusters in si

    Physical Review Letters, Vol. 82, Núm. 22, pp. 4460-4463

  3. Ostwald ripening of {113} defects precursors and transient enhanced diffusion

    Materials Research Society Symposium - Proceedings, Vol. 568, pp. 163-168

1997

  1. Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon

    Journal of Applied Physics, Vol. 81, Núm. 9, pp. 6031-6050

1995

  1. Ion implantation and transient enhanced diffusion

    Technical Digest - International Electron Devices Meeting