Publicaciones en las que colabora con Peter A. Stolk (5)
1999
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Cluster ripening and transient enhanced diffusion in silicon
Materials Science in Semiconductor Processing, Vol. 2, Núm. 4, pp. 369-376
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Energetics of self-interstitial clusters in si
Physical Review Letters, Vol. 82, Núm. 22, pp. 4460-4463
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Ostwald ripening of {113} defects precursors and transient enhanced diffusion
Materials Research Society Symposium - Proceedings, Vol. 568, pp. 163-168
1997
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Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon
Journal of Applied Physics, Vol. 81, Núm. 9, pp. 6031-6050
1995
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Ion implantation and transient enhanced diffusion
Technical Digest - International Electron Devices Meeting