Influence of interlayer trapping and detrapping mechanisms on the electrical characterization of hafnium oxide/silicon nitride stacks on silicon
- García, H.
- Dueas, S.
- Castán, H.
- Gómez, A.
- Bailón, L.
- Toledano-Luque, M.
- Del Prado, A.
- Mártil, I.
- González-Díaz, G.
Revue:
Journal of Applied Physics
ISSN: 0021-8979
Année de publication: 2008
Volumen: 104
Número: 9
Type: Article
