Influence of H on the composition and atomic concentrations of "N-rich" plasma deposited SiOxNyHz films

  1. Del Prado, A.
  2. Andrés, E.S.
  3. Mártil, I.
  4. González-Díaz, G.
  5. Bohne, W.
  6. Röhrich, J.
  7. Selle, B.
Aldizkaria:
Journal of Applied Physics

ISSN: 0021-8979

Argitalpen urtea: 2004

Alea: 95

Zenbakia: 10

Orrialdeak: 5373-5382

Mota: Artikulua

DOI: 10.1063/1.1699525 GOOGLE SCHOLAR lock_openSarbide irekia editor
Datuen iturria: Scopus