Thermal stability of a-SiNx:H films deposited by plasma electron cyclotron resonance

  1. Martínez, F.L.
  2. Del Prado, A.
  3. Bravo, D.
  4. López, F.
  5. Mártil, I.
  6. González-Díaz, G.
Journal:
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

ISSN: 0734-2101

Year of publication: 1999

Volume: 17

Issue: 4

Pages: 1280-1284

Type: Article

DOI: 10.1116/1.582110 GOOGLE SCHOLAR
Data source: Scopus