Titanium doped silicon layers with very high concentration

  1. Olea, J.
  2. Toledano-Luque, M.
  3. Pastor, D.
  4. González-Díaz, G.
  5. Mártil, I.
Aldizkaria:
Journal of Applied Physics

ISSN: 0021-8979

Argitalpen urtea: 2008

Alea: 104

Zenbakia: 1

Mota: Artikulua

DOI: 10.1063/1.2949258 GOOGLE SCHOLAR