Interface quality of high-pressure reactive sputtered and atomic layer deposited titanium oxide thin films on silicon

  1. Dueñas, S.
  2. Castán, H.
  3. García, H.
  4. Barbolla, J.
  5. Andrés, E.S.
  6. Mártil, I.
  7. González-Díaz, G.
  8. Kukli, K.
  9. Aarik, J.
Proceedings:
2005 Spanish Conference on Electron Devices, Proceedings

ISBN: 9780780388109

Year of publication: 2005

Volume: 2005

Pages: 49-52

Type: Conference paper

DOI: 10.1109/SCED.2005.1504303 GOOGLE SCHOLAR

Sustainable development goals

Data source: Scopus