Analysis of the oxygen contamination present in SiNx films deposited by electron cyclotron resonance

  1. García, S.
  2. Martin, J.M.
  3. Mártil, I.
  4. González-Diaz, G.
Revue:
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

ISSN: 1520-8559,  0734-2101

Année de publication: 1995

Volumen: 13

Número: 3

Pages: 826-830

Type: Communication dans un congrès

DOI: 10.1116/1.579835 GOOGLE SCHOLAR
La source de données: Scopus