Atomistic modeling of deactivation and reactivation mechanisms in high-concentration boron profiles

  1. Aboy, M.
  2. Pelaz, L.
  3. Marqués, L.A.
  4. Barbolla, J.
  5. Mokhberi, A.
  6. Takamura, Y.
  7. Griffin, P.B.
  8. Plummer, J.D.
Aldizkaria:
Applied Physics Letters

ISSN: 0003-6951

Argitalpen urtea: 2003

Alea: 83

Zenbakia: 20

Orrialdeak: 4166-4168

Mota: Artikulua

DOI: 10.1063/1.1628391 GOOGLE SCHOLAR
Datuen iturria: Scopus