Dose loss and segregation of boron and arsenic at the Si/SiO2 interface by atomistic kinetic Monte Carlo simulations

  1. Rubio, J.E.
  2. Jaraiz, M.
  3. Martin-Bragado, I.
  4. Castrillo, P.
  5. Pinacho, R.
  6. Barbolla, J.
Materials Science and Engineering B: Solid-State Materials for Advanced Technology

ISSN: 0921-5107

Year of publication: 2005

Volume: 124-125

Issue: SUPPL.

Pages: 392-396

Type: Conference paper

DOI: 10.1016/J.MSEB.2005.08.030 GOOGLE SCHOLAR