Modeling and simulation of the influence of SOI structure on damage evolution and ultra-shallow junction formed by Ge preamorphization implants and solid phase epitaxial regrowth

  1. Mok, K.R.C.
  2. Colombeau, B.
  3. Jaraiz, M.
  4. Castrillo, P.
  5. Rubio, J.E.
  6. Pinacho, R.
  7. Srinivasan, M.P.
  8. Benistant, F.
  9. Martin-Bragado, I.
  10. Hamilton, J.J.
Actas:
Materials Research Society Symposium Proceedings

ISSN: 0272-9172

ISBN: 9781558998681

Ano de publicación: 2006

Volume: 912

Páxinas: 99-104

Tipo: Achega congreso

DOI: 10.1557/PROC-0912-C03-04 GOOGLE SCHOLAR