Tailored deposition by LPCVD of non-stoichiometric Si oxides and their application in the formation of Si nanocrystals embedded in SiO2 by thermal annealing
- Morana, B.
- De Sande, J.C.G.
- Rodríguez, A.
- Sangrador, J.
- Rodríguez, T.
- Avella, M.
- Prieto, Á.C.
- Jiménez, J.
ISSN: 0272-9172
ISBN: 9781558999497
Year of publication: 2007
Volume: 989
Pages: 531-536
Type: Conference paper