Si interstitial contribution of F+ implants in crystalline Si

  1. López, P.
  2. Pelaz, L.
  3. Duffy, R.
  4. Meunier-Beillard, P.
  5. Roozeboom, F.
  6. Van Der Tak, K.
  7. Breimer, P.
  8. Van Berkum, J.G.M.
  9. Verheijen, M.A.
  10. Kaiser, M.
Journal:
Journal of Applied Physics

ISSN: 0021-8979

Year of publication: 2008

Volume: 103

Issue: 9

Type: Article

DOI: 10.1063/1.2917297 GOOGLE SCHOLAR
Data source: Scopus