Cathodoluminescence study of inductively coupled plasma (ICP) etched InP waveguide structures: Influence of the ridge dimension and dielectric capping

  1. Avella, M.
  2. Jiménez, J.
  3. Pommereau, F.
  4. Landesman, J.P.
  5. Rhallabi, A.
Zeitschrift:
Materials Science and Engineering B: Solid-State Materials for Advanced Technology

ISSN: 0921-5107

Datum der Publikation: 2008

Ausgabe: 147

Nummer: 2-3

Seiten: 136-140

Art: Artikel

DOI: 10.1016/J.MSEB.2007.09.071 GOOGLE SCHOLAR