Cathodoluminescence study of inductively coupled plasma (ICP) etched InP waveguide structures: Influence of the ridge dimension and dielectric capping

  1. Avella, M.
  2. Jiménez, J.
  3. Pommereau, F.
  4. Landesman, J.P.
  5. Rhallabi, A.
Revue:
Materials Science and Engineering B: Solid-State Materials for Advanced Technology

ISSN: 0921-5107

Année de publication: 2008

Volumen: 147

Número: 2-3

Pages: 136-140

Type: Article

DOI: 10.1016/J.MSEB.2007.09.071 GOOGLE SCHOLAR
La source de données: Scopus