Evolution of fluorine and boron profiles during annealing in crystalline Si

  1. López, P.
  2. Pelaz, L.
  3. Duffy, R.
  4. Meunier-Beillard, P.
  5. Roozeboom, F.
  6. Van Der Tak, K.
  7. Breimer, P.
  8. Van Berkum, J.G.M.
  9. Verheijen, M.A.
  10. Kaiser, M.
Revue:
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

ISSN: 1071-1023

Année de publication: 2008

Volumen: 26

Número: 1

Pages: 377-381

Type: Article

DOI: 10.1116/1.2794738 GOOGLE SCHOLAR
La source de données: Scopus