Monte Carlo simulation of silicon atomic displacement and amorphization induced by ion implantation
- García, L.J.
- Kawamura, Y.
- Uematsu, M.
- Hernndez-Mangas, J.M.
- Itoh, K.M.
Aldizkaria:
Journal of Applied Physics
ISSN: 0021-8979
Argitalpen urtea: 2011
Alea: 109
Zenbakia: 12
Mota: Artikulua