Physical modeling and implementation scheme of native defect diffusion and interdiffusion in SiGe heterostructures for atomistic process simulation

  1. Castrillo, P.
  2. Pinacho, R.
  3. Jaraiz, M.
  4. Rubio, J.E.
Journal:
Journal of Applied Physics

ISSN: 0021-8979

Year of publication: 2011

Volume: 109

Issue: 10

Type: Conference paper

DOI: 10.1063/1.3581113 GOOGLE SCHOLAR
Data source: Scopus