Electrical characteristics of metal-insulator-semiconductor structures with atomic layer deposited Al2 O3, HfO2, and nanolaminates on different silicon substrates

  1. Campabadal, F.
  2. Rafí, J.M.
  3. Zabala, M.
  4. Beldarrain, O.
  5. Faigón, A.
  6. Castán, H.
  7. Gómez, A.
  8. García, H.
  9. Dueas, S.
Aldizkaria:
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

ISSN: 2166-2754,  2166-2746

Argitalpen urtea: 2011

Alea: 29

Zenbakia: 1

Mota: Biltzar ekarpena

DOI: 10.1116/1.3532544 GOOGLE SCHOLAR

Objetivos de desarrollo sostenible

Datuen iturria: Scopus