Electrical Characterization of Defects Created by γ-Radiation in HfO2-Based MIS Structures for RRAM Applications

  1. García, H.
  2. González, M.B.
  3. Mallol, M.M.
  4. Castán, H.
  5. Dueñas, S.
  6. Campabadal, F.
  7. Acero, M.C.
  8. Sambuco Salomone, L.
  9. Faigón, A.
Aldizkaria:
Journal of Electronic Materials

ISSN: 0361-5235

Argitalpen urtea: 2018

Alea: 47

Zenbakia: 9

Orrialdeak: 5013-5018

Mota: Biltzar ekarpena

DOI: 10.1007/S11664-018-6257-Y GOOGLE SCHOLAR lock_openUVADOC editor
Datuen iturria: Scopus