Electrical defects in atomic layer deposited HfO2 films on silicon: Influence of precursor chemistries and substrate treatment

  1. Duenas, S
  2. Castan, H
  3. Garcia, H
  4. Bailon, L
  5. Kukli, K
  6. Ritala, M
  7. Leskela, M
Büchersammlung:
DEFECTS IN HIGH-K GATE DIELECTRIC STACKS: NANO-ELECTRONIC SEMICONDUCTOR DEVICES
  1. Gusev, E (coord.)

ISSN: 1568-2609

ISBN: 1-4020-4365-1

Datum der Publikation: 2006

Ausgabe: 220

Seiten: 287-289

Kongress: NATO Advanced Research Workshop on Defects in Advanced High -K Dielectric Nano-Electronic Seminconductor Devices

Art: Konferenz-Beitrag

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Fuente de los datos: WoS