Electrical defects in atomic layer deposited HfO2 films on silicon: Influence of precursor chemistries and substrate treatment

  1. Duenas, S
  2. Castan, H
  3. Garcia, H
  4. Bailon, L
  5. Kukli, K
  6. Ritala, M
  7. Leskela, M
Liburu bilduma:
DEFECTS IN HIGH-K GATE DIELECTRIC STACKS: NANO-ELECTRONIC SEMICONDUCTOR DEVICES
  1. Gusev, E (coord.)

ISSN: 1568-2609

ISBN: 1-4020-4365-1

Argitalpen urtea: 2006

Alea: 220

Orrialdeak: 287-289

Biltzarra: NATO Advanced Research Workshop on Defects in Advanced High -K Dielectric Nano-Electronic Seminconductor Devices

Mota: Biltzar ekarpena

GOOGLE SCHOLAR
Datuen iturria: WoS