Effects of the voltage ramp rate on the conduction characteristics of HfO2-based resistive switching devices

  1. García, H.
  2. Vinuesa, G.
  3. García-Ochoa, E.
  4. Aguirre, F.L.
  5. González, M.B.
  6. Jiménez-Molinos, F.
  7. Campabadal, F.
  8. Roldán, J.B.
  9. Miranda, E.
  10. Dueñas, S.
  11. Castán, H.
Revue:
Journal of Physics D: Applied Physics

ISSN: 1361-6463 0022-3727

Année de publication: 2023

Volumen: 56

Número: 36

Type: Article

DOI: 10.1088/1361-6463/ACDAE0 GOOGLE SCHOLAR

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