2008

1. Evolution of fluorine and boron profiles during annealing in crystalline Si

   Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 26, Núm. 1, pp. 377-381

2. F+ implants in crystalline Si: The Si interstitial contribution

   Materials Research Society Symposium Proceedings

3. Si interstitial contribution of F+ implants in crystalline Si

   Journal of Applied Physics, Vol. 103, Núm. 9