Nuevas Tecnologías para la Mejora de la Calidad de la Enseñanza
Nokia Foundation
Espoo, FinlandiaPublicaciones en colaboración con investigadores/as de Nokia Foundation (4)
2006
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InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides
Materials Science in Semiconductor Processing, Vol. 9, Núm. 1-3, pp. 225-229
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InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides
Conference Proceedings - International Conference on Indium Phosphide and Related Materials
1999
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Passivation of the Facets of 980 nm GaAs Pump Lasers by a Pulsed UV Laser-Assisted Technique
Journal of Electronic Materials, Vol. 28, Núm. 2, pp. 83-90
1995
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Raman microprobe analysis of patterned high Tc superconductor (YBCO) thin films
Materials Research Bulletin, Vol. 30, Núm. 6, pp. 771-778