Publicaciones en las que colabora con LUIS ALBERTO MARQUES CUESTA (2)

2005

  1. Dose-rate and temperature dependent statistical damage accumulation model for ion implantation into silicon

    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

1995

  1. Detailed computer simulation of ion implantation processes into crystals

    Materials Science and Technology (United Kingdom), Vol. 11, Núm. 11, pp. 1191-1193