1996

1. Atomic scale simulations of arsenic ion implantation and annealing in silicon

   Materials Research Society Symposium - Proceedings

2. Ion beam induced recrystallization of amorphous silicon: A molecular dynamics study

   Journal of Applied Physics, Vol. 80, Núm. 11, pp. 6160-6169

3. Ion-beam processing of silicon at keV energies: A molecular-dynamics study

   Physical Review B - Condensed Matter and Materials Physics, Vol. 54, Núm. 23, pp. 16683-16695

4. Molecular dynamics studies of the ion beam induced crystallization in silicon

   Materials Research Society Symposium - Proceedings

5. Surface effects during ion beam processing of materials

   Materials Research Society Symposium - Proceedings