Electricidad y Electrónica
Departamento
Interuniversity Microelectronics Centre
Lovaina, BélgicaPublicaciones en colaboración con investigadores/as de Interuniversity Microelectronics Centre (6)
2021
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Standards for the Characterization of Endurance in Resistive Switching Devices
ACS Nano, Vol. 15, Núm. 11, pp. 17214-17231
2008
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Atomistic modeling of impurity ion implantation in ultra-thin-body Si devices
Technical Digest - International Electron Devices Meeting, IEDM
2006
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Boron pocket and channel deactivation in nMOS transistors with SPER junctions
IEEE Transactions on Electron Devices, Vol. 53, Núm. 1, pp. 71-76
2005
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Effect of amorphization on activation and deactivation of boron in source/drain, channel and poly gate
Meeting Abstracts
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Effect of amorphization on activation and deactivation of boron in source/drain, channel and polygate
Proceedings - Electrochemical Society
2003
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Enhanced low temperature electrical activation of B in Si
Applied Physics Letters, Vol. 82, Núm. 2, pp. 215-217