Influence of interlayer trapping and detrapping mechanisms on the electrical characterization of hafnium oxide/silicon nitride stacks on silicon

  1. García, H.
  2. Dueas, S.
  3. Castán, H.
  4. Gómez, A.
  5. Bailón, L.
  6. Toledano-Luque, M.
  7. Del Prado, A.
  8. Mártil, I.
  9. González-Díaz, G.
Journal:
Journal of Applied Physics

ISSN: 0021-8979

Year of publication: 2008

Volume: 104

Issue: 9

Type: Article

DOI: 10.1063/1.3013441 GOOGLE SCHOLAR

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