Molecular models and activation energies for bonding rearrangement in plasma-deposited α-SiNx: H dielectric thin films treated by rapid thermal annealing

  1. Martínez, F.L.
  2. Del Prado, A.
  3. Mártil, I.
  4. González-Diaz, G.
Journal:
Physical Review B - Condensed Matter and Materials Physics

ISSN: 0163-1829

Year of publication: 2001

Volume: 63

Issue: 24

Pages: 2453201-2453211

Type: Article