Influence of electron cyclotron resonance nitrogen plasma exposure on the electrical characteristics of SiNx:H/InP structures

  1. Redondo, E.
  2. Mártil, I.
  3. González-Díaz, G.
  4. Castán, H.
  5. Dueñas, S.
Journal:
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

ISSN: 0734-211X

Year of publication: 2001

Volume: 19

Issue: 1

Pages: 186-191

Type: Article

DOI: 10.1116/1.1339010 GOOGLE SCHOLAR
Data source: Scopus