Influence of electron cyclotron resonance nitrogen plasma exposure on the electrical characteristics of SiNx:H/InP structures

  1. Redondo, E.
  2. Mártil, I.
  3. González-Díaz, G.
  4. Castán, H.
  5. Dueñas, S.
Aldizkaria:
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

ISSN: 0734-211X

Argitalpen urtea: 2001

Alea: 19

Zenbakia: 1

Orrialdeak: 186-191

Mota: Artikulua

DOI: 10.1116/1.1339010 GOOGLE SCHOLAR
Datuen iturria: Scopus