Fabrication of ta2o5 thin films by anodic oxidation of tantalum nitride and tantalum suicide: growing mechanisms, electrical characterization and ulsi m-i-m capacitor performances
- Duenas, S.
- Castan, H.
- Barbolla, J.
- Kola, R.R.
- Sullivan, P.A.
Actes:
Materials Research Society Symposium - Proceedings
ISSN: 0272-9172
Any de publicació: 1999
Volum: 567
Pàgines: 371-378
Tipus: Article