Fabrication of ta2o5 thin films by anodic oxidation of tantalum nitride and tantalum suicide: growing mechanisms, electrical characterization and ulsi m-i-m capacitor performances

  1. Duenas, S.
  2. Castan, H.
  3. Barbolla, J.
  4. Kola, R.R.
  5. Sullivan, P.A.
Konferenzberichte:
Materials Research Society Symposium - Proceedings

ISSN: 0272-9172

Datum der Publikation: 1999

Ausgabe: 567

Seiten: 371-378

Art: Artikel

DOI: 10.1557/PROC-567-371 GOOGLE SCHOLAR