Fabrication of ta2o5 thin films by anodic oxidation of tantalum nitride and tantalum suicide: growing mechanisms, electrical characterization and ulsi m-i-m capacitor performances

  1. Duenas, S.
  2. Castan, H.
  3. Barbolla, J.
  4. Kola, R.R.
  5. Sullivan, P.A.
Proceedings:
Materials Research Society Symposium - Proceedings

ISSN: 0272-9172

Year of publication: 1999

Volume: 567

Pages: 371-378

Type: Article

DOI: 10.1557/PROC-567-371 GOOGLE SCHOLAR
Data source: Scopus